CVD-PVD Process Controller

SkillDev tools

Chemical/Physical Vapor Deposition skill for thin film and nanostructure deposition optimization

Instructions available. Your AI can read the instructions. Execution depends on the setup they require.

Account requirements not reviewed. Check the skill instructions before use; ahel provides instructions and does not run this skill.

Add ahel to your AI once: Claude, ChatGPT, Cursor, Claude Code or Codex. Then ask it to use this.

Then ask your AI: use the CVD-PVD Process Controller skill

What this skill tells your AI

The instructions your AI receives, as published by a5c-ai/babysitter in library/specializations/domains/science/nanotechnology/skills/cvd-pvd-process-controller/SKILL.md and read by ahel’s review.

Purpose

The CVD-PVD Process Controller skill provides comprehensive vapor deposition process control for thin film and nanostructure fabrication, enabling optimized growth conditions for various material systems.

Capabilities

CVD precursor chemistry selection
Temperature and pressure optimization
Plasma-enhanced CVD protocols
PVD sputtering/evaporation control
Film stress management
Rate and uniformity optimization

Usage Guidelines

Deposition Process Control

CVD Optimization
- Select precursor chemistry
- Optimize flow rates
- Control temperature profile
PVD Control
- Optimize sputter power
- Control deposition rate
- Manage film stress
Quality Assurance
- Monitor thickness in-situ
- Characterize composition
- Verify stoichiometry

Process Integration

Thin Film Deposition Process Optimization
Nanodevice Integration Process Flow

Input Schema

{
  "deposition_type": "cvd|pecvd|sputtering|evaporation",
  "material": "string",
  "target_thickness": "number (nm)",
  "substrate": "string",
  "quality_requirements": {
    "uniformity": "number (%)",
    "stress": "string (tensile|compressive|neutral)"
  }
}

Output Schema

{
  "process_parameters": {
    "temperature": "number (C)",
    "pressure": "number (mTorr)",
    "power": "number (W)",
    "gas_flows": [{"gas": "string", "flow": "number (sccm)"}]
  },
  "deposition_rate": "number (nm/min)",
  "uniformity": "number (%)",
  "film_stress": "number (MPa)",
  "composition": [{"element": "string", "fraction": "number"}]
}

Signals

GitHub stars: 2k
Forks: 112
Last commit: Sep 2026

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Item type: skill
Key: cvd-pvd-process-controller
Source: github.com/a5c-ai/babysitter

github.com/a5c-ai/babysitter