EBL Process Controller

SkillDev tools

Electron Beam Lithography skill for high-resolution nanopatterning with dose optimization and proximity effect correction

Instructions available. Your AI can read the instructions. Execution depends on the setup they require.

Account requirements not reviewed. Check the skill instructions before use; ahel provides instructions and does not run this skill.

Add ahel to your AI once: Claude, ChatGPT, Cursor, Claude Code or Codex. Then ask it to use this.

Then ask your AI: use the EBL Process Controller skill

What this skill tells your AI

The instructions your AI receives, as published by a5c-ai/babysitter in library/specializations/domains/science/nanotechnology/skills/ebl-process-controller/SKILL.md and read by ahel’s review.

Purpose

The EBL Process Controller skill provides comprehensive electron beam lithography process control, enabling high-resolution nanopatterning through dose optimization, proximity effect correction, and critical dimension control.

Capabilities

Pattern design and fracturing
Dose optimization and modulation
Proximity effect correction (PEC)
Alignment and overlay control
Resist processing optimization
Critical dimension (CD) control

Usage Guidelines

EBL Process Control

Pattern Preparation
- Design in CAD software
- Fracture into write fields
- Apply beam step size
Dose Optimization
- Run dose matrices
- Apply PEC algorithms
- Account for pattern density
Process Integration
- Optimize resist thickness
- Control development conditions
- Verify feature dimensions

Process Integration

Nanolithography Process Development
Nanodevice Integration Process Flow

Input Schema

{
  "pattern_file": "string",
  "resist": "string",
  "thickness": "number (nm)",
  "target_cd": "number (nm)",
  "beam_voltage": "number (kV)",
  "beam_current": "number (pA)"
}

Output Schema

{
  "optimized_dose": "number (uC/cm2)",
  "pec_parameters": {
    "alpha": "number",
    "beta": "number",
    "eta": "number"
  },
  "write_time": "number (hours)",
  "expected_cd": "number (nm)",
  "cd_uniformity": "number (3sigma)"
}

Signals

GitHub stars: 2k
Forks: 112
Last commit: Sep 2026

Advanced

Item type: skill
Key: ebl-process-controller
Source: github.com/a5c-ai/babysitter

github.com/a5c-ai/babysitter